Edwards advanced semiconductor vacuum pumps have been field-proven to perform to the highest operating standards. Reliability and high performance are achieved by extending service life, improving uptime and increasing productivity, while minimizing footprint and cost of ownership.

Features and Benefits

  • Optimized utilities consumption.
  • No preventative maintenance required.
  • Cantilevered shafts and specially profiled rotors for better handling of particles.
  • Reserve motor power also maximizes reliability on harsh-duty CVD applications.
  • Corrosion resistant materials allow pumping of corrosive gases.
  • Higher operating temperatures provide ample margin to prevent gas condensation.
  • The one-piece shaft eliminates the need for a motor coupling and a fifth pumping stage removes the need for a silencer and eliminates particle accumulation, both reducing the overall footprint.


  • Load Lock
  • Transfer
  • Metrology
  • Lithography
  • PVD Process
  • PVD Pre-clean
  • RTA
  • Strip/Ashing
  • Etching
  • Implant Source
  • RTP
  • MCVD
  • ALD
Technical data  
Peak Speed 1000 m3h-1
  589 cfm
  16670 l min-1
Ultimate Vacuum 1 x 10-3 mbar
  7.5 x 10-4 Torr
  0.1 Pa
Typical shaft seal nitrogen flow 4 slm
Inlet Connection ISO100
Outlet Connection NW40
Typical cooling water flow at 15 psi pressure drop 240 l h-1
  4 l min-1
Weight 430 kg
Power input at ultimate 3.8 kW
Rated motor power 6.1 kW
Oil Capacity 1.48 l

All figures are typical without gas ballast.